Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 052167574X
  • Release Date: 2005-07-14
  • Number of pages: 460
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press



This book provides a systematic introduction to the physics behind measurements on plasmas. It develops from first principles the concepts needed to plan, execute, and interpret plasma diagnostics. The book is therefore accessible to graduate students and professionals with little specific plasma physics background, but is also a valuable reference for seasoned plasma physicists. Most of the examples are taken from laboratory plasma research, but the focus on principles makes the treatment useful to all experimental and theoretical plasma physicists, including those interested in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field. Specific areas of added coverage include neutral-beam-based diagnostics, flow measurement with mach probes, equilibrium of strongly shaped plasmas and fusion product diagnostics.

Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 0521803896
  • Release Date: 2002-07-18
  • Number of pages: 458
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press



This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.

Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 0521385830
  • Release Date: 1990-04-27
  • Number of pages: 380
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press



Principles of Plasma Diagnostics is the most modern and comprehensive book in its field. It joins for the first time a body of knowledge previously scattered throughout scientific literature. The text is based on first-principles development of the required concepts, so it is accessible to students and researchers with little plasma physics background. Nevertheless, even seasoned plasma physicists should find insight in the lucid development of the fundamentals as they apply to diagnostics and also appreciate the work as a valuable reference. Although most of the examples of diagnostics in action are taken from fusion research, the work's focus on principles will make it useful to all plasma physicists, those interested in space and astrophysical plasmas as well as laboratory plasmas, and theoreticians as well as experimenters themselves.

Lecture Notes on Principles of Plasma Processing

  • Filename: lecture-notes-on-principles-of-plasma-processing.
  • ISBN: 0306474972
  • Release Date: 2003-01-31
  • Number of pages: 208
  • Author: Francis F. Chen
  • Publisher: Springer Science & Business Media



Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Principles of Plasma Discharges and Materials Processing

  • Filename: principles-of-plasma-discharges-and-materials-processing.
  • ISBN: 9780471724247
  • Release Date: 2005-04-22
  • Number of pages: 730
  • Author: Michael A. Lieberman
  • Publisher: John Wiley & Sons



A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Plasma Physics

  • Filename: plasma-physics.
  • ISBN: 3540252746
  • Release Date: 2005-06-09
  • Number of pages: 496
  • Author: Andreas Dinklage
  • Publisher: Springer Science & Business Media



Plasma Physics: Confinement, Transport and Collective Effects provides an overview of modern plasma research with special focus on confinement and related issues. Beginning with a broad introduction, the book leads graduate students and researchers – also those from related fields - to an understanding of the state-of-the-art in modern plasma physics. Furthermore, it presents a methodological cross section ranging from plasma applications and plasma diagnostics to numerical simulations, the latter providing an increasingly important link between theory and experiment. Effective references guide the reader from introductory texts through to contemporary research. Some related exercises in computational plasma physics are supplied on a special web site

Plasma Physics

  • Filename: plasma-physics.
  • ISBN: 3642104916
  • Release Date: 2010-06-14
  • Number of pages: 398
  • Author: Alexander Piel
  • Publisher: Springer Science & Business Media



This book is an outgrowth of courses in plasma physics which I have taught at Kiel University for many years. During this time I have tried to convince my students that plasmas as different as gas dicharges, fusion plasmas and space plasmas can be described in a uni ed way by simple models. The challenge in teaching plasma physics is its apparent complexity. The wealth of plasma phenomena found in so diverse elds makes it quite different from atomic physics, where atomic structure, spectral lines and chemical binding can all be derived from a single equation—the Schrödinger equation. I positively accept the variety of plasmas and refrain from subdividing plasma physics into the traditional, but arti cially separated elds, of hot, cold and space plasmas. This is why I like to confront my students, and the readers of this book, with examples from so many elds. By this approach, I believe, they will be able to become discoverers who can see the commonality between a falling apple and planetary motion. As an experimentalist, I am convinced that plasma physics can be best understood from a bottom-up approach with many illustrating examples that give the students con dence in their understanding of plasma processes. The theoretical framework of plasma physics can then be introduced in several steps of re nement. In the end, the student (or reader) will see that there is something like the Schrödinger equation, namely the Vlasov-Maxwell model of plasmas, from which nearly all phenomena in collisionless plasmas can be derived.

Fundamentals of Plasma Physics

  • Filename: fundamentals-of-plasma-physics.
  • ISBN: 9781475740301
  • Release Date: 2013-06-29
  • Number of pages: 679
  • Author: J. A. Bittencourt
  • Publisher: Springer Science & Business Media



Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses. Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.

Low Temperature Plasma Technology

  • Filename: low-temperature-plasma-technology.
  • ISBN: 9781466509900
  • Release Date: 2013-07-15
  • Number of pages: 493
  • Author: Paul K. Chu
  • Publisher: CRC Press



Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.

Lecture Notes on Principles of Plasma Processing

  • Filename: lecture-notes-on-principles-of-plasma-processing.
  • ISBN: 0306474972
  • Release Date: 2003-01-31
  • Number of pages: 208
  • Author: Francis F. Chen
  • Publisher: Springer Science & Business Media



Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Nonthermal Plasma Chemistry and Physics

  • Filename: nonthermal-plasma-chemistry-and-physics.
  • ISBN: 9781420059168
  • Release Date: 2012-11-13
  • Number of pages: 564
  • Author: Jurgen Meichsner
  • Publisher: CRC Press



In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Introduction to Plasma Physics and Controlled Fusion

  • Filename: introduction-to-plasma-physics-and-controlled-fusion.
  • ISBN: 9783319223094
  • Release Date: 2015-12-17
  • Number of pages: 490
  • Author: Francis F. Chen
  • Publisher: Springer



This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons. For the third edition, updates was made throughout each existing chapter, and two new chapters were added; Ch 9 on “Special Plasmas” and Ch 10 on Plasma Applications (including Atmospheric Plasmas).

Waves in Plasmas

  • Filename: waves-in-plasmas.
  • ISBN: 0883188597
  • Release Date: 1992
  • Number of pages: 566
  • Author: Thomas H. Stix
  • Publisher: Springer Science & Business Media



"Blurb & Contents" "The reader is treated to constantly refreshing and engaging commentary and opinion that always informs....As she depicts them, the problems of the universe are always fascinating and, most of all, they are alive and compelling." David DeVorkin, Sky & Telescope Virginia Trimble offers readers a fascinating and accessible tour of the stars. An astronomer with shared appointments in California and Maryland, the author ranges over a large portion of the universe as she discusses the search for life on other planets, how galaxies form, why stars explode and die, and the nature of the elusive dark matter in the universe. She also explains the astronomical significance of Cheeps' pyramid and leads the reader through scientific speculation about what and when the Star of Bethlehem might have been. Throughout, Trimble points to the exciting unanswered questions that still perplex the field and considers the formidable tasks to be faced by the next generation of young astronomers.

Monopolizing Knowledge

  • Filename: monopolizing-knowledge.
  • ISBN: 9780983702306
  • Release Date: 2011-07-01
  • Number of pages: 272
  • Author: Ian Hutchinson
  • Publisher: Lulu.com



Can real knowledge be found other than by science? In this unique approach to understanding today's culture wars, an MIT physicist answers emphatically yes. He shows how scientism --- the view that science is all the knowledge there is --- suffocates reason as well as religion. Tracing the history of scientism and its frequent confusion with science, Hutchinson explains what makes modern science so persuasive and powerful, but restricts its scope. Recognizing science's limitations, and properly identifying what we call nature, liberates both science and non-scientific knowledge.

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