Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 052167574X
  • Release Date: 2005-07-14
  • Number of pages: 460
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press

This book provides a systematic introduction to the physics behind measurements on plasmas. It develops from first principles the concepts needed to plan, execute, and interpret plasma diagnostics. The book is therefore accessible to graduate students and professionals with little specific plasma physics background, but is also a valuable reference for seasoned plasma physicists. Most of the examples are taken from laboratory plasma research, but the focus on principles makes the treatment useful to all experimental and theoretical plasma physicists, including those interested in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field. Specific areas of added coverage include neutral-beam-based diagnostics, flow measurement with mach probes, equilibrium of strongly shaped plasmas and fusion product diagnostics.

Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 0521803896
  • Release Date: 2002-07-18
  • Number of pages: 458
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press

This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.

Principles of Plasma Diagnostics

  • Filename: principles-of-plasma-diagnostics.
  • ISBN: 0521385830
  • Release Date: 1990-04-27
  • Number of pages: 380
  • Author: I. H. Hutchinson
  • Publisher: Cambridge University Press

Principles of Plasma Diagnostics is the most modern and comprehensive book in its field. It joins for the first time a body of knowledge previously scattered throughout scientific literature. The text is based on first-principles development of the required concepts, so it is accessible to students and researchers with little plasma physics background. Nevertheless, even seasoned plasma physicists should find insight in the lucid development of the fundamentals as they apply to diagnostics and also appreciate the work as a valuable reference. Although most of the examples of diagnostics in action are taken from fusion research, the work's focus on principles will make it useful to all plasma physicists, those interested in space and astrophysical plasmas as well as laboratory plasmas, and theoreticians as well as experimenters themselves.

Lecture Notes on Principles of Plasma Processing

  • Filename: lecture-notes-on-principles-of-plasma-processing.
  • ISBN: 0306474972
  • Release Date: 2003-01-31
  • Number of pages: 208
  • Author: Francis F. Chen
  • Publisher: Springer Science & Business Media

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Principles of Plasma Discharges and Materials Processing

  • Filename: principles-of-plasma-discharges-and-materials-processing.
  • ISBN: 9780471724247
  • Release Date: 2005-04-22
  • Number of pages: 730
  • Author: Michael A. Lieberman
  • Publisher: John Wiley & Sons

A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Plasma Physics

  • Filename: plasma-physics.
  • ISBN: 3540252746
  • Release Date: 2005-06-09
  • Number of pages: 496
  • Author: Andreas Dinklage
  • Publisher: Springer Science & Business Media

Plasma Physics: Confinement, Transport and Collective Effects provides an overview of modern plasma research with special focus on confinement and related issues. Beginning with a broad introduction, the book leads graduate students and researchers – also those from related fields - to an understanding of the state-of-the-art in modern plasma physics. Furthermore, it presents a methodological cross section ranging from plasma applications and plasma diagnostics to numerical simulations, the latter providing an increasingly important link between theory and experiment. Effective references guide the reader from introductory texts through to contemporary research. Some related exercises in computational plasma physics are supplied on a special web site

Low Temperature Plasma Technology

  • Filename: low-temperature-plasma-technology.
  • ISBN: 9781466509900
  • Release Date: 2013-07-15
  • Number of pages: 493
  • Author: Paul K. Chu
  • Publisher: CRC Press

Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.

Plasma Physics

  • Filename: plasma-physics.
  • ISBN: 3642104916
  • Release Date: 2010-06-14
  • Number of pages: 398
  • Author: Alexander Piel
  • Publisher: Springer Science & Business Media

This book is an outgrowth of courses in plasma physics which I have taught at Kiel University for many years. During this time I have tried to convince my students that plasmas as different as gas dicharges, fusion plasmas and space plasmas can be described in a uni ed way by simple models. The challenge in teaching plasma physics is its apparent complexity. The wealth of plasma phenomena found in so diverse elds makes it quite different from atomic physics, where atomic structure, spectral lines and chemical binding can all be derived from a single equation—the Schrödinger equation. I positively accept the variety of plasmas and refrain from subdividing plasma physics into the traditional, but arti cially separated elds, of hot, cold and space plasmas. This is why I like to confront my students, and the readers of this book, with examples from so many elds. By this approach, I believe, they will be able to become discoverers who can see the commonality between a falling apple and planetary motion. As an experimentalist, I am convinced that plasma physics can be best understood from a bottom-up approach with many illustrating examples that give the students con dence in their understanding of plasma processes. The theoretical framework of plasma physics can then be introduced in several steps of re nement. In the end, the student (or reader) will see that there is something like the Schrödinger equation, namely the Vlasov-Maxwell model of plasmas, from which nearly all phenomena in collisionless plasmas can be derived.

Waves in Plasmas

  • Filename: waves-in-plasmas.
  • ISBN: 0883188597
  • Release Date: 1992
  • Number of pages: 566
  • Author: Thomas H. Stix
  • Publisher: Springer Science & Business Media

"Blurb & Contents" "The reader is treated to constantly refreshing and engaging commentary and opinion that always informs....As she depicts them, the problems of the universe are always fascinating and, most of all, they are alive and compelling." David DeVorkin, Sky & Telescope Virginia Trimble offers readers a fascinating and accessible tour of the stars. An astronomer with shared appointments in California and Maryland, the author ranges over a large portion of the universe as she discusses the search for life on other planets, how galaxies form, why stars explode and die, and the nature of the elusive dark matter in the universe. She also explains the astronomical significance of Cheeps' pyramid and leads the reader through scientific speculation about what and when the Star of Bethlehem might have been. Throughout, Trimble points to the exciting unanswered questions that still perplex the field and considers the formidable tasks to be faced by the next generation of young astronomers.

Computational Methods in Plasma Physics

  • Filename: computational-methods-in-plasma-physics.
  • ISBN: 1439810958
  • Release Date: 2010-06-02
  • Number of pages: 372
  • Author: Stephen Jardin
  • Publisher: CRC Press

Assuming no prior knowledge of plasma physics or numerical methods, Computational Methods in Plasma Physics covers the computational mathematics and techniques needed to simulate magnetically confined plasmas in modern magnetic fusion experiments and future magnetic fusion reactors. Largely self-contained, the text presents the basic concepts necessary for the numerical solution of partial differential equations. Along with discussing numerical stability and accuracy, the author explores many of the algorithms used today in enough depth so that readers can analyze their stability, efficiency, and scaling properties. He focuses on mathematical models where the plasma is treated as a conducting fluid, since this is the most mature plasma model and most applicable to experiments. The book also emphasizes toroidal confinement geometries, particularly the tokamak—a very successful configuration for confining a high-temperature plasma. Many of the basic numerical techniques presented are also appropriate for equations encountered in a higher-dimensional phase space. One of the most challenging research areas in modern science is to develop suitable algorithms that lead to stable and accurate solutions that can span relevant time and space scales. This book provides an excellent working knowledge of the algorithms used by the plasma physics community, helping readers on their way to more advanced study.


  • Filename: fusion.
  • ISBN: 9780124818514
  • Release Date: 2005-01
  • Number of pages: 186
  • Author: G. M. McCracken
  • Publisher: Academic Press

Unraveling the role of fusion in the universe has taken almost a century since Einstein's proof of the equivalence of energy and matter in 1905. The discovery that fusion reactions are responsible for the building of the light elements in the "Big Bang" and the subsequent development of the heavier elements in the stars and in exploding supernovae is one of the field's most exciting successes. In this engaging book, McCracken and Stott reexamine these discoveries in astrophysics and discuss the possibility that fusion reactions are not only our sun's source of power, but may also be induced for our use on earth. * Details the initial discovery of nuclear fusion, all related research, and today's concern over future energy supply * Examines current attempts to create nuclear fusion here on earth * Enhanced with color illustrations and examples * Provides a non-technical treatment of fusion using straightforward language * Includes technical notes for aspiring physicists

Nonthermal Plasma Chemistry and Physics

  • Filename: nonthermal-plasma-chemistry-and-physics.
  • ISBN: 9781420059168
  • Release Date: 2012-11-13
  • Number of pages: 564
  • Author: Jurgen Meichsner
  • Publisher: CRC Press

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Building Scientific Apparatus

  • Filename: building-scientific-apparatus.
  • ISBN: 9781139478656
  • Release Date: 2009-06-25
  • Number of pages:
  • Author: John H. Moore
  • Publisher: Cambridge University Press

Unrivalled in its coverage and unique in its hands-on approach, this guide to the design and construction of scientific apparatus is essential reading for every scientist and student of engineering, and physical, chemical, and biological sciences. Covering the physical principles governing the operation of the mechanical, optical and electronic parts of an instrument, new sections on detectors, low-temperature measurements, high-pressure apparatus, and updated engineering specifications, as well as 400 figures and tables, have been added to this edition. Data on the properties of materials and components used by manufacturers are included. Mechanical, optical, and electronic construction techniques carried out in the lab, as well as those let out to specialized shops, are also described. Step-by-step instruction supported by many detailed figures, is given for laboratory skills such as soldering electrical components, glassblowing, brazing, and polishing.

Introduction to Plasma Physics and Controlled Fusion

  • Filename: introduction-to-plasma-physics-and-controlled-fusion.
  • ISBN: 9783319223094
  • Release Date: 2015-12-17
  • Number of pages: 490
  • Author: Francis F. Chen
  • Publisher: Springer

This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons. For the third edition, updates was made throughout each existing chapter, and two new chapters were added; Ch 9 on “Special Plasmas” and Ch 10 on Plasma Applications (including Atmospheric Plasmas).

Plasma Etching

  • Filename: plasma-etching.
  • ISBN: 0191590290
  • Release Date: 1998-05-28
  • Number of pages: 356
  • Author: M. Sugawara
  • Publisher: OUP Oxford

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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